Author:
Karl Oliver Tomson

Atomic layer deposition – the intersection of materials science, physics, chemistry and industry

There are thousands of techniques of making materials. But how can something be made, that is so small, it is not even visible under a regular optical microscope? For example, today’s electronics industry routinely makes thin films that have a thickness of 100 nanometers (nm), 50 nm or even 3 nm. And how is such a material studied, for determining a novel material in a research laboratory or performing quality control in a company? How can one measure a material’s thickness and composition if it’s thickness is a mere 10 nm, for example?

Atomic Layer Deposition (ALD) is a thin-film deposition technique that plays a critical role in advancing modern technologies, from semiconductors and energy storage to coatings for medical devices and optics. Its unique ability to deposit ultra-thin films with atomic-level precision makes it a cornerstone of innovation in nanotechnology and materials science. Most computers, solar panels and mobile phones have some details in them made using ALD. But the fun doesn’t stop at currently existing technologies. Scientists and engineers are constantly working to find new ways how to utilize thin films made by ALD in various new technologies, such as neuromorphic computing that is advancing AI.

This course offers participants a rare opportunity to explore ALD and it’s applications in depth, blending theoretical knowledge with hands-on experience. You will not only learn the principles and applications of ALD but also operate equipment to perform your own film depositions. Beyond that, you'll gain experience in characterization techniques, including spectroscopic ellipsometry, X-ray diffraction (XRD), and scanning electron microscopy (SEM), to analyze the structure, composition, and properties of the deposited films. 

At the conclusion of the course, you will collaborate in groups to compile your findings and theoretical knowledge into a comprehensive project report. This report will be presented to other groups and will include a detailed description of the project's background, a summary of your results, and a concluding discussion, including potential applications of the films you have deposited.

 

Information about the course

Focus area:

Thin film deposition and characterization

Coordinating unit:  

Institute of Physics, Univeristy of Tartu

Study Field:

Materials science, nanomaterials

Course Leader:

Kristjan Kalam, PhD

Format:

Summer Course

Location:

Institute of Physics 
(W. Ostwaldi 1, Tartu)

Course dates:

28 July - 8 August 2025

Language:

English

ECTS:

3

Study group:   

BA/MA students

 

Lecturers

Kristjan Kalam, PhD

 Taivo Jõgiaas, PhD

 Jekaterina Kozlova, PhD  

Hugo Mändar, PhD

Research Fellow in Materials Science at the University of Tartu's Institute of Physics, specifically within the Laboratory of Thin Film Technology. His research focuses on areas such as atomic layer deposition, ellipsometry, x-ray diffraction, and ferromagnetism. Research Fellow in Materials Science at the University of Tartu's Institute of Physics, specifically within the Laboratory of Thin Film Technology.He has contributed to over 30 publications, with his research focusing on areas such as atomic layer deposition and the mechanical and optical properties of thin films.
Research Fellow in Electron Microscopy at the University of Tartu's Institute of Physics, specifically within the Laboratory of Thin Film Technology. She has expertise in areas such as nanoparticles, composites, thin films, nanocomposites, and nanomaterials synthesis.
Senior Researcher at the University of Tartu's Institute of Physics, specializing in X-ray diffraction, atomic layer deposition, and nanoscale architecture. His work includes studies on the mechanical and optical properties of Cr₂O₃ thin films grown by atomic layer deposition.

 

Application deadline: 30 April 2025

Application period: 1 April - 30 April 2025
NB! All of the applicants are required to pay a non-refundable application fee of EUR 25. Your application will only be processed after the University has received the fee. The application fee is required to facilitate the admissions process and will not be refunded, regardless of the admission result.

 

Course fee: 800EUR

Includes:
Study materials
10 days of academic work with lecturers
 Certificate of completion (3 ECTS)
5 cultural events in the evenings
Ticket to University of Tartu museums

NB! Transportation and accommodation costs are not included. The course fee does not cover participant's lunch during the summer school. 

 

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